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DXSIP-400 sputtering ion pump
DXSIP-400 sputtering ion pump
DXSIP-400 sputtering ion pump
1. Technical indicator
| Item | Unit | Parameters | |
| Pumping rate | L/S | nitrogen | 430(at 1×10-6pa) |
| 290(at 1×10-7Pa) | |||
| argon | 150(at1×10-7Pa) | ||
| Ultimate pressure | pa | ≤5.0×10-9 (ambient temperature≤25℃ | |
| Start pressure | Pa | ≤2×10-2 | |
| Baking temperature | ℃ | ≤300(with magnet) | |
| termination flange | CF150 | ||
| Anode voltage | kV | ≤+7(dc) | |
| Overall dimension | mm | 442(L)×244w)×460(H) | |
| Weight | Kg | 96 | |
2.Installation diagram
3. Pumping speed curve
| pumping speed curve(N2) | extraction curve(Ar) |
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The corresponding relationship curve between the pressure and Ion flow curve
testing process of the saturated pumping performance: Take an example of DXSIP-200
Extreme pressure test process: Take an example of DXSIP-400
Magnetic leakage distribution: Take an example of DXSIP-400
Residual gas analysis Take an example of DXSIP-400
Equipment test data
test basis:
DXSIP performance test according to ISO/DIS 3556/1 sputtering ion pump- performance test- Performance measurement-first part and<<CB/T 2965-92 Sputtering ion pump performance test methods>> specific standard and ect.
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DXSIP-400 sputtering ion pump
DXT-450 Magnetron Sputtering System
