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DXJ-450D Single Chamber Magnetron Sputtering System
DXJ-450D Single Chamber Magnetron Sputtering System
Application
It is apply for the preparation of a new type thin-film material, including nanoscale monolayer and multilayer multifunctional film, hard film, metal film, semiconductor film, dielectric film and so on. It can be widely applied for the thin-film material scientific research and small batch preparation of universities and research institutions.
Composition
The system mainly consists of sputtering vacuum chamber, magnetron sputtering target, substrate water-cooling heat plate, working gas circuit, pumping system, vacuum measurement, electronic control system and installation cabinet.
DXJ-450D Single Chamber Magnetron Sputtering System
Technical Index
| Model | DXJ-450D | |
| Size of Vacuum Chamber | Cylindrical vacuum chamber size: Ø450*350mm | |
| Configuration of Vacuum System | Compound molecular pump, mechanical pump, slide valve | |
| Ultimate Pressure | ≤6.67*10-5Pa (after bake and degassing) | |
| Time of Recovery Vacuum | Reach 6.6*10-4Pa in 40 mins ( expose in air for short time and inflate dry chlorine and then begin air exhaust) | |
| Component of Permanent Magnetron Sputtering Targets | Three permanent targets, target size: Ø60mm (One among them could sputter magnetic material.) Radio sputtering of each target and direct current sputtering are compatible. Three targets could deflect to above sample center together. The distance between target and sample is 90-110mm, which is adjustable. When sputtering upwards, the distance between target and sample is 40-80mm | |
| Single Substrate Water-cooling Heat Plate | Substrate Structure | Substrate heating and water cooling work independently for each other. Taking down the heating furnace could install water cooling substrate plate. |
| Sample Size | Ø30 mm | |
| Mode of Motion | Substrate could continuously rotate. revolving speed: 5-10 rpm | |
| Heat | MAX. heat temperature of substrate: 600℃±1℃ | |
| Negative Substrate Bias | -200V | |
| Air Circuit System | Quality flow controller 2 channel | |
| Computer Control System | Control rotation of sample, switch of baffle, confirmation of target place and so on | |
| *Accessories for Choice 6 Stations Substrate Revolution Plate |
Removing single substrate water cooling heating plate could install this plate. It could be placed 6 pieces 30mm substrates. One among 6 stations for installation of heating furnace, other for water cooling substrate plate or natural cooling. MAX. heat temperature of substrate is 600℃±1℃. | |
| Floor Space | Mainframe | 1300*800mm2 |
| Electric Control Cabinet | 700*700mm2(2 sets) | |
Home >
vacuum applied systems >
DXJ-450D Single Chamber Magnetron Sputtering System
DXT-450 Magnetron Sputtering System
