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DXJ-560D Pyriform Single Chamber Magnetron Sputtering System
DXJ-560D Pyriform Single Chamber Magnetron Sputtering System
Application
It is apply for the preparation of a new type thin-film material, including nanoscale monolayer and multilayer multifunctional film, hard film, metal film, semiconductor film, dielectric film and so on. It can be widely applied for the thin-film material scientific research and small batch preparation of universities and research institutions.
Composition
The system mainly consists of sputtering vacuum chamber, magnetron sputtering target, substrate water-cooling heat revolution plate, working gas circuit, pumping system, installation cabinet, vacuum measurement and electronic control system.
DXJ-560D Pyriform Single Chamber Magnetron Sputtering System
Technical Index
| Model | DXJ-560D | |
| Sputtering Vacuum Chamber | Pyriform sputtering vacuum chamber size: Ø560*350mm | |
| Configuration of Vacuum System | Compound molecular pump, mechanical pump, slide valve | |
| Ultimate Pressure | 2.0*10-5Pa (after bake and degassing) | |
| Time of Recovery Vacuum | System is exposed in air and inflated dry chlorine and then begins air exhaust in short time. It could reach 6.6*10-4Pa in 40 mins. | |
| Component of Permanent Magnetron Sputtering Targets | Five permanent targets, target size: Ø60mm (One among them could sputter magnetic material.) Radio sputtering of each target and direct current sputtering are compatible. The distance between target and sample is 40-80mm, which is adjustable. | |
| Substrate Water-cooling Heat Revolution Plate | Substrate Structure | 6 stations and one for installation of heating furnace other for water cooling substrate plate |
| Sample Size | Ø30 mm. It could accept 6 pieces | |
| Mode of Motion | 0-360°back and front rotating | |
| Heat | MAX. heat temperature of substrate 600℃±1℃ | |
| Negative Substrate Bias | -200V | |
| Air Circuit System | Quality flow controller 2 channel | |
| Computer Control System | Control rotation of sample, switch of baffle and confirmation of target place | |
| Floor Space | Mainframe | 1300*800mm2 |
| Electric Control Cabinet | 700*700mm2(2 sets) | |
Home >
vacuum applied systems >
DXJ-560D Pyriform Single Chamber Magnetron Sputtering System
DXT-450 Magnetron Sputtering System
