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Home > vacuum applied systems > DXD-450 Single Chamber Thermal Evaporation Vacuum Coating Machine

DXD-450 Single Chamber Thermal Evaporation Vacuum Coating Machine

Application

It is apply for the preparation of metal elementary substance film, semiconductor film, oxidized thin films, organic thin-film, and so on. It can be used in research of new material, new technology film of scientific institutions. It could also used in test work before batch production.

Composition

The system mainly consists of organic/ metal source evaporation sediment chamber, vacuum exhaust system, vacuum measurement system, evaporation source, sample heating control temperature, electronic control system, distribution system and so on.

 

DXD-450 Single Chamber Thermal Evaporation Vacuum Coating Machine

DXD-450 Single Chamber Thermal Evaporation Vacuum Coating Machine

Technical Index

Model DXD-450
Main Vacuum Chamber Square vacuum chamber, size: 400*400*400mm
Configuration of Vacuum System Mechanical pump, molecular pump, slide valve
Ultimate Pressure ≤6*10-5Pa
Time of Recovery Vacuum Reach 9*10-4Pa in 40 mins ( expose in air for short time and inflate dry chlorine and then begin air exhaust)
Substrate Heat Plate Sample Size 120*120mm, 1 piece
Mode of Motion Substrate could be up and down, mutation range: 0-50mm
Substrate could continuously rotate. revolving speed: 5-30rpm
Heat MAX. heat temperature of substrate 800℃±1℃
The distance between substrate and evaporation: 250mm-300mm
Organic Resistance Evaporation Source Crucible Crucible capacity: ≥2cc
Temperature Room temperature—500℃， continuous and adjustable
Power Current: 300A, Max. output power: 3Kw
Water Cooling Electrode  4 pieces, could be made into 2 evaporation boats
Quartz Crystal Film Thickness Controller Monitor thickness of film display range: 0-99μ9999Å
Air Circuit System Quality flow controller 1 channel
Laser beam scanning device Two-dimension scanning mechanical stage, carry out two freely scanning
Computer Control System It controls revolution target plate, rotation of target, rotation of sample, control temperature of sample, laser beam scanning and so on.
Floor Space Mainframe 2450*1250mm2 ( independent rack, (770*600mm2) The size matches up glove case (1830*750mm2)
Electric Control Cabinet 700*700mm2(1 set)

 

 

 

 

 

 

 

 

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