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DXP-450B Laser Coating Equipment
DXP-450B Laser Coating Equipment
Application
It is for preparing superconducting thin films, semiconductor films, ferroelectric films and so on. It is suitable for the thin-film material scientific research and small batch preparation of universities and research institutions.
Composition
The system mainly consists of sputtering vacuum chamber, rotating target platform, antioxidative substrate heat plate, working air circuit, air-bleed system, installation machine, vacuum measurement, electric control system and so on.
DXP-450B Laser Coating Equipment
Technical Index
| Model | DXP-450B | |
| Main Vacuum Chamber | Sphere, size: Ø450mm | |
| Configuration of Vacuum System | Mechanical pump, molecular pump | |
| Ultimate Pressure | ≤6.67*10-6Pa (after bake and degassing) | |
| Time of Recovery Vacuum | Reach 5*10-3Pa in 20 mins ( expose in air for short time and inflate dry chlorine and then begin air exhaust) | |
| Rotating Target Platform | Target size: Ø60mm or Ø25mm, could install 4 pieces targets for one time, could achieve revolution change target and each target could achieve rotating. Rotating speed: 5-60 rpm | |
| Substrate Heat Plate | Sample Size | 2 inches |
| Mode of Motion | Substrate could continuously rotate. revolving speed: 5-60rpm | |
| Heat | MAX. heat temperature of substrate 800℃±1℃ | |
| Air Circuit System | Quality flow controller 1 channel | |
| Laser beam scanning device | Two-dimension scanning mechanical stage, carry out two freely scanning | |
| Computer Control System | It controls revolution target plate, rotation of target, rotation of sample, control temperature of sample, laser beam scanning and so on. | |
| Floor Space | Mainframe | 1500*900mm2 |
| Electric Control Cabinet | 700*700mm2(1 sets) | |
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vacuum applied systems >
DXP-450B Laser Coating Equipment
DXT-450 Magnetron Sputtering System
