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DXP-450B Laser Coating Equipment

Application

It is for preparing superconducting thin films, semiconductor films, ferroelectric films and so on. It is suitable for the thin-film material scientific research and small batch preparation of universities and research institutions.

Composition

The system mainly consists of sputtering vacuum chamber, rotating target platform, antioxidative substrate heat plate, working air circuit, air-bleed system, installation machine, vacuum measurement, electric control system and so on.

 

DXP-450B Laser Coating Equipment

DXP-450B Laser Coating Equipment

Technical Index

Model DXP-450B
Main Vacuum Chamber Sphere, size: Ø450mm
Configuration of Vacuum System Mechanical pump, molecular pump
Ultimate Pressure ≤6.67*10-6Pa (after bake and degassing)
Time of Recovery Vacuum Reach 5*10-3Pa in 20 mins ( expose in air for short time and inflate dry chlorine and then begin air exhaust)
Rotating Target Platform Target size: Ø60mm or Ø25mm, could install 4 pieces targets for one time, could achieve revolution change target and each target could achieve rotating. Rotating speed: 5-60 rpm
Substrate Heat Plate Sample Size 2 inches
Mode of Motion Substrate could continuously rotate. revolving speed: 5-60rpm
Heat MAX. heat temperature of substrate 800℃±1℃
Air Circuit System Quality flow controller 1 channel
Laser beam scanning device Two-dimension scanning mechanical stage, carry out two freely scanning
Computer Control System It controls revolution target plate, rotation of target, rotation of sample, control temperature of sample, laser beam scanning and so on.
Floor Space Mainframe 1500*900mm2
Electric Control Cabinet 700*700mm2(1 sets)

 

 

 

 

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