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Home > Dry vacuum equipment > DXJM, DXJH series dry vacuum pump ( Unit ) >JGH-1000B in the application of semiconductor devices

JGH-1000B in the application of semiconductor devices

DXJM、DXJH series dry pump mainly applies for the field of integrated circuit、photovoltaic and LED, and made big success in application. Application process includes loading cavity、etching、tubular PECVD、removing of photoresist、PECVD.
The following is a contrast experiment on the client, technics environment: PECVD.
Experiment 1 is the extraction ability test for pump to N2; Experiment 2 is the extraction ability test for pump to N2O; Experiment 3 is customer’ Continuous sedimentary standard process after using pump, comparing process indicators: sedimentary rate、refractive index、uniformity and stress differential test. Through the above test, the result shows that: the dry pump could meet the customers’ comprehensive requirements of base pressure、pump down time、impact to the film and the reliability in the aspect of PECVD process.

 

DXJM, DXJH series dry vacuum pump ( Unit ) DXJM, DXJH series dry vacuum pump ( Unit )

Experment1: extraction time test
Testing cavity: PECVD equipment reaction cavity
Testing conditions: cavity temperature 400℃, TV valve in full open position, nitrogen access to different stable flow, stable pressure recording when the pump cavity pumping out

Conclusion: DXJH-1000B is consistent with the original use pump, alternative in the standard process 

Experiment 2: extraction time test
Testing cavity: PECVD equipment reaction cavity
Testing conditions: cavity temperature 400℃, TV valve in full open position, nitrogen access to different stable flow, stable pressure recording when the pump cavity pumping out

Conclusion: DXJH-1000B is consistent with the original use pump, alternative in the standard process
DXJM, DXJH series dry vacuum pump ( Unit ) DXJM, DXJH series dry vacuum pump ( Unit )

 

Experiment3: the process influence to silicon sample


Customer’ continuous sedimentary standard process, comparing process indicators: sedimentary rate(DR)、refractive index(RI)、uniformity(U%) and stress differential test.
Conclusion: DR、RI、U%、Stress meet customers’ index.

 

The above indicators meet customers’ requirements:

 

Index

Original using pump

Scientific instrument pump

DR

4500±200

4358±87

4387±85

RI

1.465±0.015

1.461±0.02

1.463±0.02

U(On chip)

≤1%

≤1%

≤1%

U(Inter-chip)

≤1%

0.10%

0.22%

U(Inter-assay)

≤1%

0.43%

0.38%

Stress

-80—120

-89—100

-74--100

 

 

 

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